The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2026
Filed:
Jun. 14, 2023
Daikin Industries, Ltd., Osaka, JP;
Tatsuya Takakuwa, Osaka, JP;
Tomo Otsuka, Osaka, JP;
Atsushi Noguchi, Osaka, JP;
Yuuta Hasumoto, Osaka, JP;
DAIKIN INDUSTRIES, LTD., Osaka, JP;
Abstract
The present disclosure provides a method for producing a reaction gas containing 1,1,2-trifluoroethane (R-143) and/or (E,Z)-1,2-difluoroethylene (R-1132(E,Z)) using a starting material that is easier to obtain than those used in conventional methods. Specifically, the present disclosure provides a method for producing a reaction gas containing 1,1,2-trifluoroethane (R-143) and/or (E,Z)-1,2-difluoroethylene (R-1132(E,Z)), the method comprising subjecting a starting material gas containing difluoromethane (R-32) to a reaction that involves thermal decomposition at a pressure of 0.6 MPaG or more and 2.0 MPaG or less and a temperature of 600° C. or more and 1000° C. or less, thereby obtaining the reaction gas.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile