Nagoya, Japan

Tomo Inoue

This inventor holds 2 USPTO granted patents. Top assignee: Brother Kogyo Kabushiki-Kaisha. Active years: 1991-1996.


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 2

Forward Citations = 35(Granted Patents)


Company Filing History:


Years Active: 1991-1996

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2 patents (USPTO):Explore Patents

Title: Tomo Inoue: Innovator in Sewing Technology

Introduction

Tomo Inoue is a notable inventor based in Nagoya, Japan. He has made significant contributions to the field of sewing technology, holding 2 patents that showcase his innovative spirit and technical expertise.

Latest Patents

Inoue's latest patents include a sewing machine and a recording medium designed for use in combination with stitching data. The sewing machine patent focuses on an embroidery pattern that utilizes reference point data to ensure accurate stitching on a workpiece. This innovation allows for efficient and precise determination of pattern positions during the embroidery process. His second patent, the stitch pattern sewing machine, features a ROM that stores both triple stitch pattern data for larger patterns and single stitch pattern data for smaller ones. This machine includes a pattern selecting unit, an enlargement switch, and a reduction switch, all controlled by a CPU that adjusts the stitch thickness based on the selected pattern size.

Career Highlights

Tomo Inoue is currently employed at Brother Kogyo Kabushiki-Kaisha, a leading company in the sewing machine industry. His work has significantly advanced the capabilities of sewing technology, making it more efficient and user-friendly.

Collaborations

Inoue collaborates with talented coworkers, including Takashi Hirata and Fujio Horie, who contribute to the innovative environment at Brother Kogyo Kabushiki-Kaisha.

Conclusion

Tomo Inoue's contributions to sewing technology through his patents reflect his dedication to innovation and improvement in the industry. His work continues to influence the way sewing machines operate, enhancing the user experience and efficiency.

Profile summary based on public USPTO records.
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