The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 25, 1991

Filed:

May. 22, 1990
Applicant:
Inventors:

Fujio Horie, Nagoya, JP;

Tomo Inoue, Nagoya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
D05B / ;
U.S. Cl.
CPC ...
112456 ; 112458 ;
Abstract

A stitch pattern sewing machine includes a ROM for storing triple stitch pattern data for a large size pattern and single stitch pattern data for a small size pattern for each pattern of a plurality of patterns, a pattern selecting unit for selecting one of the patterns, an enlargement switch for enlarging a size of the pattern selected by the pattern selecting unit, a reduction switch for reducing the size of the pattern selected by the pattern selecting unit, a CPU, and a driving unit for forming a stitch. The CPU selects one of the triple stitch pattern data and the single stitch data based on size of the pattern. The CPU controls the driving unit based on the selected pattern data and size of the pattern. As a result, stitch thickness can be varied with pattern size to maintain a desired appearance.


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