Tom Yu

Title: Innovations of Tom Yu in Physical Vapor Deposition Technology

Introduction

Tom Yu is an accomplished inventor based in San Leandro, CA (US). He has made significant contributions to the field of physical vapor deposition (PVD) technology, holding a total of 5 patents. His work focuses on improving the processes and apparatus used in thin film deposition, which is crucial for various applications in electronics and materials science.

Latest Patents

One of Tom Yu's latest patents is titled "Deposition of thin continuous PVD seed layers having improved adhesion to the barrier layer." This patent describes methods for depositing thin seed layers that enhance both the continuity of the seed layer and its adhesion to the barrier layer. The methods involve performing an etchback operation in the seed deposition chamber prior to the deposition of the seed layer. This etch step effectively removes any barrier layer overhang and/or oxide that may have formed on the barrier layer. In some embodiments, a small deposition flux of seed atoms accompanies the sputter etch flux of argon ions, embedding metal atoms into the barrier layer. These embedded metal atoms create nucleation sites for subsequent seed layer deposition, promoting continuous seed layer film growth, film stability, and improved seed layer-barrier layer adhesion.

Another notable patent is the "Apparatus and method for improving film uniformity in a physical vapor deposition system." This patent outlines a PVD system that includes a hollow cathode magnetron with a downstream plasma control mechanism. The magnetron features a hollow cathode with a non-planar target and at least one electromagnetic coil to generate and maintain plasma within the cathode. Additionally, the magnetron has an anode located between the cathode and the downstream plasma control mechanism, which comprises multiple electromagnetic coils arranged to form a tapered magnetic convergent lens.

Career Highlights

Throughout his career, Tom Yu has worked with notable companies, including Novellus Systems Incorporated. His expertise in PVD technology has positioned him as a key player in the development of advanced deposition techniques.

Collaborations

Tom Yu has collaborated with several professionals in his field, including Jean Qing Lu and Jeffrey A Tobin. These collaborations have contributed to the advancement of PVD technology and the successful implementation of his patented methods.

Conclusion

Tom Yu's innovative work in physical vapor deposition technology has led to significant advancements in the field. His patents