Tom J McIntyre

Title: Tom J McIntyre: Innovator in Semiconductor Manufacturing

Introduction

Tom J McIntyre is a notable inventor based in Nokesville, VA (US). He has made significant contributions to the field of semiconductor manufacturing. His innovative approach has led to the development of a unique method that enhances the efficiency of semiconductor production.

Latest Patents

Tom J McIntyre holds a patent for a "Method for manufacturing microscopic canals within a semiconductor." This patent describes a process where a shallow trench is initially formed on a substrate using a patterned photoresist. After the removal of the patterned photoresist, a separation layer, such as a Titanium layer, is deposited on the substrate. Subsequently, a cap layer, such as a Titanium nitride layer, is added on top of the separation layer. Both layers are then polished off from the surface of the substrate. Finally, a Tungsten layer is deposited on the substrate and within the trench, resulting in the formation of a microcanal.

Career Highlights

Tom J McIntyre is currently employed at BAE Systems Information and Electronic Systems Integration Inc. His work focuses on advancing technologies in the semiconductor industry. He has demonstrated a commitment to innovation and excellence throughout his career.

Collaborations

Tom has collaborated with talented coworkers, including Tuyet T Bach and Andrew T Pomerene. Their combined expertise contributes to the success of their projects and the advancement of semiconductor technologies.

Conclusion

Tom J McIntyre is a distinguished inventor whose work in semiconductor manufacturing has made a significant impact. His patented method for creating microscopic canals within semiconductors showcases his innovative spirit and dedication to advancing technology.