Austin, TX, United States of America

Tom J Goodwin

This inventor holds 1 USPTO granted patent. Top assignee: Advanced Micro Devices Corporation. Active years: 2001.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: The Innovations of Tom J Goodwin

Introduction

Tom J Goodwin is an accomplished inventor based in Austin, TX. He has made significant contributions to the field of semiconductor technology. His innovative work focuses on improving sputter etching techniques, which are crucial in the manufacturing of semiconductor devices.

Latest Patents

Tom J Goodwin holds a patent for a "Device for reducing plasma etch damage and method for manufacturing same." This patent addresses the challenges associated with plasma etch damages during sputter etching. The technique involves utilizing a semiconductor wafer with at least one diode formed within an inactive region near the wafer's outer periphery. This diode helps prevent charge transfer or arcing, thereby minimizing issues such as gate oxide breakdown and threshold voltage skew. His patent is a testament to his dedication to enhancing manufacturing processes in the semiconductor industry. He has 1 patent to his name.

Career Highlights

Tom J Goodwin is currently employed at Advanced Micro Devices Corporation, a leading company in the semiconductor industry. His work at AMD has allowed him to apply his innovative ideas and contribute to the development of advanced technologies. His expertise in sputter etching techniques has positioned him as a valuable asset to his team.

Collaborations

Throughout his career, Tom has collaborated with notable colleagues, including Tony T Phan and John K Lowell. These collaborations have fostered an environment of innovation and have led to advancements in semiconductor manufacturing techniques.

Conclusion

Tom J Goodwin's contributions to the field of semiconductor technology are noteworthy. His patent for reducing plasma etch damage showcases his innovative spirit and commitment to improving manufacturing processes. His work at Advanced Micro Devices Corporation continues to influence the industry positively.

Profile summary based on public USPTO records.
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