Kasugai, Japan

Tokuhide Nawata

This inventor holds 1 USPTO granted patent. Top assignee: Ckd Corporation. Active years: 2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tokuhide Nawata. Retrieved from https://idiyas.com/inventor/tokuhide-nawata

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 21(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Tokuhide Nawata

Introduction

Tokuhide Nawata is a prominent inventor based in Kasugai, Japan. He is known for his innovative work in the field of flow control technology. His contributions have significantly advanced the efficiency and functionality of flow controllers.

Latest Patents

Nawata holds a patent for a "Pulse shot type flow controller and pulse shot type flow controlling method." This invention introduces a novel approach to flow control by utilizing a pulse shot mechanism. The method involves the repeated opening and closing of two cutoff valves, allowing for precise control of the volume flow of process gas. This innovation overcomes conventional limitations and enhances the performance of flow controllers.

Career Highlights

Nawata is associated with Ckd Corporation, where he has made significant contributions to the development of advanced flow control systems. His work has been instrumental in improving the efficiency of various industrial processes.

Collaborations

Nawata has collaborated with notable colleagues, including Hiroki Doi and Masayuki Watanabe. Their teamwork has fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Tokuhide Nawata's contributions to flow control technology exemplify the spirit of innovation. His patent and collaborative efforts continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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