Tohru Ohkuma

Title: Tohru Ohkuma: Innovator in Resist Pattern Technology

Introduction

Tohru Ohkuma is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of photoresist technology, particularly in the development of methods for forming resist patterns. His innovative approach has implications for various applications in electronics and materials science.

Latest Patents

Tohru Ohkuma holds a patent for a method of forming a resist pattern. This method involves exposing a novolak type positive photoresist to ultraviolet light in a specific pattern. It further includes irradiating the entire surface with far ultraviolet light, with a wavelength of 200 to 320 nm, in an atmosphere with an inert gas partial pressure ratio of 90% or more. The result is a resist pattern with a specific gradient of solubility that increases from the surface toward the depthwise direction. This technique achieves a contrast value that is twice as high as conventional methods, allowing for the formation of high aspect ratio resist patterns. He has 1 patent to his name.

Career Highlights

Tohru Ohkuma is associated with Matsushita Electronics Corporation, where he has applied his expertise in resist pattern technology. His work has contributed to advancements in the manufacturing processes of electronic components, enhancing the precision and efficiency of production.

Collaborations

Throughout his career, Tohru has collaborated with notable colleagues, including Yoshimitsu Okuda and Morio Inoue. These collaborations have fostered innovation and have led to the development of new technologies in their respective fields.

Conclusion

Tohru Ohkuma's contributions to resist pattern technology exemplify the impact of innovative thinking in the electronics industry. His patented methods continue to influence advancements in manufacturing processes, showcasing the importance of research and development in driving technological progress.