Company Filing History:
Years Active: 2001-2002
Title: Celebrating the Innovations of Tohru Komatsu: A Pioneer in Semiconductor Technology
Introduction
Tohru Komatsu, an inventive mind based in Yokosuka, Japan, has made significant contributions to the field of semiconductor technology. With a portfolio that includes two notable patents, he continues to pave the way for advancements in manufacturing reliable and efficient semiconductor devices.
Latest Patents
Komatsu's most recent patents focus on the development of a refractory metal silicide target and the associated methods of manufacturing. His innovative target is defined by a fine mixed structure consisting of refractory metal silicide (MSi) grains and silicon (Si) grains. Notably, the invention emphasizes the design whereby the total number of MSi grains found in a cross section of 0.01 mm does not exceed 15. This specific configuration enables the MSi grains to maintain an average size of not more than 10 micrometers, with free Si grains filling gaps having a maximum size of 20 micrometers. The resulting high-density, high-purity structure, coupled with minimal impurities (including oxygen), facilitates reduced particle generation during sputtering. Consequently, Komatsu's target improves film resistance stability and overall semiconductor device yield and reliability.
Career Highlights
Tohru Komatsu has demonstrated expertise in the semiconductor field through his dedicated work at Kabushiki Kaisha Toshiba. His focus on innovative materials and methods showcases his commitment to enhancing the efficiency and quality of semiconductor manufacturing processes, positioning him as a valuable asset to the industry.
Collaborations
Throughout his career, Komatsu has collaborated with esteemed colleagues, including Michio Sato and Takashi Yamanobe. These partnerships not only highlight his willingness to engage with other intelligent minds but also illustrate the collaborative spirit that drives innovation in technology.
Conclusion
Tohru Komatsu's work, particularly his latest patents in refractory metal silicide targets, exemplifies the intersection of innovative thinking and practical application in semiconductor technology. His contributions at Kabushiki Kaisha Toshiba and collaborative efforts with fellow inventors enhance the field's progress, making a lasting impact on the development of reliable and efficient semiconductor devices.