Auburn, PA, United States of America

Todd R Seigfried

This inventor holds 1 USPTO granted patent. Top assignee: Lucent Technologies Inc.. Active years: 1997.


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 21(Granted Patents)


Company Filing History:


Years Active: 1997

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1 patent (USPTO):Explore Patents

Title: Todd R. Seigfried: Innovator in Mask Layout Generation

Introduction

Todd R. Seigfried is an accomplished inventor based in Auburn, PA (US). He has made significant contributions to the field of integrated circuit fabrication through his innovative patent. His work focuses on automating the generation of mask layouts, which are crucial for the production of integrated circuits.

Latest Patents

Todd R. Seigfried holds a patent for a "System and method for generating mask layouts." This invention integrates various mask layout tools to automate the generation of mask layouts corresponding to an input netlist and a timing specification. The method involves automatically sizing transistors specified in the netlist, clustering them into cells, generating a cell library, and placing-and-routing the cells to create the mask layout. The system includes associated memory and stored programs, featuring a range of mask layout tools operated by a processor running an automatic mask layout generation program.

Career Highlights

Todd is currently employed at Lucent Technologies Inc., where he continues to develop innovative solutions in the field of integrated circuits. His expertise in mask layout generation has positioned him as a valuable asset in the industry.

Collaborations

Throughout his career, Todd has collaborated with notable colleagues, including John P. Fishburn and Craig R. Kemp. These partnerships have contributed to the advancement of technology in their respective fields.

Conclusion

Todd R. Seigfried is a prominent inventor whose work in mask layout generation has significantly impacted integrated circuit fabrication. His innovative approach continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
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