Todd L Biggs

Title: Todd L. Biggs and Vacuum-Generated Imprinting

Introduction

Todd L. Biggs is an inventor associated with Queen Creek, Arizona, and Intel Corporation. His listed patent work includes a system and method for vacuum-generated imprinting, an approach designed to form patterns in impressionable materials.

Latest Patents

Biggs’s listed patent, “System and Method for Vacuum Generated Imprinting,” describes a system that creates a substantial vacuum in an imprinting area to generate a pressure differential within an imprinting chamber. The system can form conductive traces on substrates used to mount integrated circuit chips and dies in semiconductor packages.

A low-pressure line evacuates air from the vessel’s material-receiving area. The resulting pressure differential moves pistons that press microtools into impressionable material layers. This arrangement helps the microtools accommodate variations in material thickness and reduces air pockets between the tools and the material.

The supplied information lists 3 patents. The imprinting patent description was provided twice, so it is presented here as one distinct patent entry.

Career Highlights

Biggs is associated with Intel Corporation, a company involved in semiconductor technology. His described invention addresses a manufacturing process for creating patterned substrates that can support semiconductor packaging.

Collaborations

Jeff Wienrich is identified as Biggs’s coworker. The supplied information does not specify a particular patent collaboration between them.

Conclusion

Todd L. Biggs’s listed patent work focuses on vacuum-generated imprinting, using pressure differentials and microtools to create patterns in materials for semiconductor packaging.