Todd B Abrams

Title: **Todd B Abrams: Innovating Semiconductor Technology in Round Lake, NY**

Introduction

Todd B Abrams is an accomplished inventor based in Round Lake, NY, with a notable contribution to the semiconductor industry. He currently works for GlobalFoundries Inc., where he focuses on advancing technology in the fabrication process.

Latest Patents

Abrams holds a patent for a significant invention titled "Silicon liner for STI CMP stop in FinFET." This innovative patent describes a procedure where a hardmask is used to pattern a first material into fins. The process involves forming a layer of silicon that is thicker on the hardmask elements than on the fins, ultimately contributing to more efficient semiconductor manufacturing. The invention also discusses the annealing process and the application of chemical mechanical polishing to achieve a planar isolation material, simplifying the final etching procedure.

Career Highlights

Todd B Abrams has established himself as a key player in the semiconductor field, with his patent reflecting his deep understanding of chemical and mechanical processes in fabrication. His work at GlobalFoundries Inc. places him at the forefront of innovation in semiconductor technology, impacting the efficiency and performance of FinFET devices.

Collaborations

Throughout his career, Abrams has collaborated with other talented professionals, including colleagues Yiheng Xu and Haiting Wang. These collaborations have been vital in enhancing the development of technological solutions and advancing the collective expertise within the organization.

Conclusion

In conclusion, Todd B Abrams exemplifies the spirit of innovation and collaboration in the semiconductor industry. His contributions, particularly through his patented technology, continue to support advancements in manufacturing processes, thereby shaping the future of semiconductor devices. With a strong career at GlobalFoundries Inc., Abrams is sure to remain an influential figure in the field of innovation.