Todd Albertson

Title: The Innovative Contributions of Todd Albertson

Introduction

Todd Albertson is a notable inventor based in Boise, ID (US), recognized for his significant contributions to the field of integrated circuit technology. With a total of 3 patents to his name, Albertson has made strides in enhancing the functionality and reliability of electronic components.

Latest Patents

One of Albertson's latest patents is focused on a multi-layer interconnect with an isolation layer. This innovative design involves fabricating an integrated circuit interconnect by using a mask to form a via in an insulating layer for a conductive plug. After the plug is formed, a thin isolation layer is deposited over the structure. An opening is created in the isolation layer using the same mask at a different radiation exposure level, making the opening narrower than the underlying plug. A conductive line is then formed, establishing electrical contact with the plug through the opening in the isolation layer. This design effectively reduces the likelihood of undesired electrical shorts between the conductive plug and nearby conductive lines by vertically separating and electrically isolating them.

Career Highlights

Todd Albertson is currently employed at Micron Technology Incorporated, where he continues to innovate and develop advanced technologies. His work has significantly impacted the field of semiconductor manufacturing, contributing to the efficiency and performance of electronic devices.

Collaborations

Throughout his career, Albertson has collaborated with talented individuals such as Darin Miller and Mark Francis Anderson. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Todd Albertson's contributions to the field of integrated circuits exemplify the spirit of innovation. His patents and collaborative efforts continue to shape the future of technology, making him a key figure in the industry.