Ting-Yih Lu

Title: Innovations of Ting-Yih Lu in Microelectronics

Introduction

Ting-Yih Lu is a notable inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of microelectronics, particularly through his innovative patent related to plasma etching methods. His work is essential for advancing the fabrication processes in the semiconductor industry.

Latest Patents

Ting-Yih Lu holds a patent titled "Plasma etch method for forming metal-fluoropolymer residue free vias." This patent describes a plasma etch method for creating a patterned silicon-containing dielectric layer within microelectronics fabrication. The process involves a plasma reactor chamber where a substrate, metal layer, silicon-containing dielectric layer, and patterned photoresist layer are utilized. The method employs a fluorine-containing etchant gas to etch through the layers, ensuring minimal residue formation on the etched metal layer.

Career Highlights

Ting-Yih Lu is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His expertise in plasma etching techniques has contributed to the efficiency and effectiveness of microelectronics fabrication processes.

Collaborations

Ting-Yih Lu has collaborated with notable colleagues such as Po-Tao Chu and Ming-Chieh Yeh. Their combined efforts in research and development have furthered advancements in semiconductor technologies.

Conclusion

Ting-Yih Lu's innovative work in plasma etching methods exemplifies the critical role of inventors in the semiconductor industry. His contributions continue to influence microelectronics fabrication, paving the way for future advancements.