Ting-Chung Wang

Title: Ting-Chung Wang: Innovator in Semiconductor Technology

Introduction

Ting-Chung Wang is a notable inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patents. With a total of 2 patents, Wang continues to push the boundaries of what is possible in his industry.

Latest Patents

One of Wang's latest patents is focused on etch profile control of isolation trenches. This device includes a substrate, a first fin, a second fin, a first isolation structure, a second isolation structure, and a gate structure. The first fin extends from a p-type region of the substrate, while the second fin extends from an n-type region. The first isolation structure is positioned over the p-type region and adjacent to the first fin, featuring a bottom surface and opposite first and second sidewalls. A first round corner is located between the bottom surface and the first sidewall of the first isolation structure, with the first sidewall being substantially parallel to the second sidewall. The second isolation structure is situated over the n-type region and adjacent to the first fin, with the first isolation structure being deeper than the second. The gate structure is positioned over the first isolation structure, covering the first fin.

Career Highlights

Ting-Chung Wang is currently employed at Taiwan Semiconductor Manufacturing Company Ltd., a leading firm in the semiconductor industry. His work has been instrumental in advancing technologies that are critical to modern electronics.

Collaborations

Wang has collaborated with notable colleagues such as Hsien-Chung Huang and Chiung-Wen Hsu, contributing to various projects that enhance semiconductor technology.

Conclusion

Ting-Chung Wang is a prominent figure in the semiconductor field, with a focus on innovative solutions that improve technology. His patents and collaborations reflect his commitment to advancing the industry.