Ting-Chang Hsu

Title: Innovations of Ting-Chang Hsu

Introduction

Ting-Chang Hsu is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of photolithography, particularly in the area of mask defect prevention. With a total of 3 patents to his name, Hsu continues to push the boundaries of innovation in semiconductor manufacturing.

Latest Patents

One of Hsu's latest patents focuses on a photolithographic mask assembly designed to prevent defects. This innovative assembly includes a capping layer over a substrate and an absorber layer disposed over the capping layer. The absorber layer is structured with a first main feature area, a second main feature area, and a venting feature area located between the two main feature areas. The venting feature area is equipped with a plurality of venting features, enhancing the overall functionality of the mask.

Career Highlights

Hsu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work there has allowed him to collaborate with other talented professionals and contribute to groundbreaking advancements in technology.

Collaborations

Some of Hsu's notable coworkers include Chi-Ta Lu and Chih-Chiang Tu. Their collective expertise fosters an environment of innovation and creativity within the company.

Conclusion

Ting-Chang Hsu's contributions to photolithography and semiconductor manufacturing exemplify the spirit of innovation. His patents and collaborations continue to influence the industry, paving the way for future advancements.