This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignees: Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.v., Friedrich-Schiller-Universitat Jena. Active years: 2018.
Company Filing History:
1 out of 4,920 
1 out of 27 Years Active: 2018
Title: Tina Weichelt: Innovator in Lithographic Exposure Technology
Introduction
Tina Weichelt is a prominent inventor based in Jena, Germany. She has made significant contributions to the field of lithographic exposure technology. Her innovative work has led to the development of a unique illumination unit that enhances the efficiency and effectiveness of lithographic processes.
Latest Patents
Tina Weichelt holds a patent for an "Illumination unit and device for lithographic exposure." This invention includes a beam source, an electronically drivable beam deflection element for generating a temporally varying two-dimensional beam deflection, a collimation lens, a beam homogenizing element, a Fourier lens, and a field lens. This patent represents her commitment to advancing technology in the field.
Career Highlights
Throughout her career, Tina has worked with esteemed organizations such as Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. and Friedrich-Schiller-Universität Jena. Her experience in these institutions has allowed her to collaborate with leading experts in her field and contribute to groundbreaking research.
Collaborations
Tina has collaborated with notable colleagues, including Uwe Zeitner and Yannick Bourgin. These partnerships have enriched her work and fostered innovation in lithographic exposure technology.
Conclusion
Tina Weichelt is a trailblazer in the field of lithographic exposure, with a patent that showcases her innovative spirit. Her contributions to technology and collaboration with esteemed institutions highlight her impact on the industry.