The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 16, 2018
Filed:
Sep. 07, 2016
Applicants:
Fraunhofer-gesellschaft Zur Förderung Der Angewandten Forschung E.v., Munich, DE;
Friedrich-schiller-universität Jena, Jena, DE;
Inventors:
Assignees:
Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V., München, DE;
Friedrich-Schiller-Universität Jena, Jena, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/72 (2006.01); G03F 7/20 (2006.01); G02B 26/10 (2006.01); G02B 26/08 (2006.01); G02B 27/09 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70075 (2013.01); G02B 26/0833 (2013.01); G02B 26/10 (2013.01); G02B 26/101 (2013.01); G02B 26/105 (2013.01); G02B 27/0944 (2013.01); G02B 27/0955 (2013.01); G03F 7/70158 (2013.01); G03F 7/70583 (2013.01);
Abstract
An illumination unit for lithographic exposure and a device for lithographic exposure are disclosed. In an embodiment the illumination unit includes a beam source, an electronically drivable beam deflection element for generating a temporally varying two-dimensional beam deflection, a collimation lens, a beam homogenizing element, a Fourier lens and a field lens.