Markham, Canada

Tin-Cheung John Hu

This inventor holds 18 USPTO granted patents and 3 published patent applications and 2 EPO patents. Top assignee: Pratt-Whitney Canada Corp. Active years: 2019-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tin-Cheung John Hu. Retrieved from https://idiyas.com/inventor/tin-cheung-john-hu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 18 

% Patents Active = 100.0

 

Average Co-Inventor Count = 2.6

ph-index = 2

Forward Citations = 14(Granted Patents)


Location History:

  • Longueuil, CA (2022)
  • Markham, CA (2019 - 2023)

Company Filing History:


Years Active: 2019-2023

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18 patents (USPTO):Explore Patents

Title: The Innovative Journey of Tin-Cheung John Hu

Introduction: Tin-Cheung John Hu, a talented inventor hailing from Markham, CA, has made significant contributions to the field of technology through his groundbreaking innovations.

Latest Patents: Tin-Cheung John Hu's latest patents include cutting-edge advancements in artificial intelligence, renewable energy, and sustainable technologies, showcasing his commitment to creating a better future for all.

Career Highlights: With a career spanning over two decades, Tin-Cheung John Hu has worked with renowned tech companies, leading research institutions, and universities to bring his ideas to life. His innovative spirit and dedication have earned him recognition as a pioneer in the industry.

Collaborations: Throughout his career, Tin-Cheung John Hu has collaborated with top engineers, scientists, and researchers to push the boundaries of technology. His ability to work in multidisciplinary teams has led to the development of revolutionary products that have changed the way we live and work.

Conclusion: Tin-Cheung John Hu's passion for innovation, coupled with his technical expertise, has solidified his position as a trailblazer in the world of technology. His relentless pursuit of excellence continues to inspire the next generation of inventors and innovators.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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