Fremont, CA, United States of America

Timothy Tran

This inventor holds 1 USPTO granted patent. Top assignee: Lam Research Corporation. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Timothy Tran. Retrieved from https://idiyas.com/inventor/timothy-tran-bsl0xmua

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Innovations by Timothy Tran

Introduction

Timothy Tran is an accomplished inventor based in Fremont, CA. He has made significant contributions to the field of semiconductor processing. His innovative work focuses on optimizing highly selective process gases for etching materials in semiconductor substrates.

Latest Patents

Timothy Tran holds 1 patent for his invention titled "Methods and apparatus for the optimization of highly selective process gases." This patent describes a method for etching a barrier material on a semiconductor substrate. The process involves placing the substrate in a plasma processing chamber and flowing an etchant gas mixture that selectively etches the barrier material at a first etch rate, while etching the low-k material at a second etch rate, which is substantially lower.

Career Highlights

Timothy Tran is currently employed at Lam Research Corporation, a leading company in semiconductor manufacturing equipment. His work at Lam Research has allowed him to develop advanced techniques that enhance the efficiency and effectiveness of semiconductor processing.

Collaborations

Throughout his career, Timothy has collaborated with notable colleagues, including Guang-Yaw Hwang and Thomas D Nguyen. These collaborations have contributed to the advancement of technologies in the semiconductor industry.

Conclusion

Timothy Tran's innovative contributions to semiconductor processing demonstrate his expertise and commitment to advancing technology. His patent reflects a significant step forward in optimizing etching processes, which is crucial for the development of modern electronics.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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