Timothy J Stanfield

Title: Innovations by Timothy J. Stanfield: Pioneering Non-Planar Surface Patterning

Introduction

Timothy J. Stanfield, an innovative inventor based in Lewis Center, Ohio, has made significant contributions to the field of technology through his four patented inventions. His work primarily focuses on patterning non-planar surfaces and high-resolution photomasks, showcasing his expertise and commitment to advancing engineering solutions.

Latest Patents

One of his latest patents is for a system designed for forming patterns on parts with complex geometries. This innovative system comprises a chamber base, a pressure vessel, and a retaining device that secures a deformable mask. The design ingeniously utilizes three pressure sources: the first generates negative pressure to draw the mask towards the part, while the second utilizes positive pressure to ensure that the mask accurately corresponds to the part's intricate non-planar surfaces. The third pressure source further contributes to this process by maintaining negative pressure within the pressure vessel. An exposure source is employed to expose the part through the mask, allowing for high-resolution patterns that adhere to the unique shapes of the components being manufactured.

Another notable patent by Stanfield involves the creation of a high-resolution film photomask. This photomask features a polymer substrate, initially transparent to specific light wavelengths, that can be selectively darkened during exposure operations. This process enables the formation of a desired pattern without the need for chemical processing, highlighting the efficiency and simplicity of his design. The photomask's innovative attributes, including an applied filter to block light within certain wavelength ranges, further illustrate Stanfield's ability to push the boundaries of photomask technology.

Career Highlights

Timothy J. Stanfield is affiliated with Battelle Memorial Institute, where he leverages his profound technical knowledge and creative problem-solving capabilities to drive forward innovative projects. His contributions have not only facilitated advancements in photomask technology but have also enhanced manufacturing processes across various industries.

Collaborations

Throughout his career, Stanfield has collaborated with talented professionals such as Eric L. Hogue and Stephen J. Krak. These partnerships exemplify a commitment to teamwork and the sharing of knowledge, which are essential in the fast-evolving field of technology and patent development.

Conclusion

In summary, Timothy J. Stanfield represents the spirit of innovation through his impactful patents and collaborations. His work in developing advanced systems for patterning non-planar surfaces and high-resolution photomasks underscores his role as a vital contributor to the engineering community. As he continues to evolve and inspire, his inventions hold the promise of driving future technologies towards unprecedented heights.