The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 01, 2009
Filed:
Aug. 09, 2007
Stephen J. Krak, Newark, OH (US);
Joel D Elhard, Hilliard, OH (US);
Eric L Hogue, Galloway, OH (US);
Timothy J Stanfield, Lewis Center, OH (US);
Richard P Heggs, Dublin, OH (US);
Stephen J. Krak, Newark, OH (US);
Joel D Elhard, Hilliard, OH (US);
Eric L Hogue, Galloway, OH (US);
Timothy J Stanfield, Lewis Center, OH (US);
Richard P Heggs, Dublin, OH (US);
Battelle Memorial Institute, Columbus, OH (US);
Abstract
Electromagnetic radiation sensitive mask materials are provided. The mask materials are chosen such a first percentage of electromagnetic radiation at a first wavelength is transmitted through the mask material prior to the exposure of the mask material to electromagnetic radiation at a second wavelength and a second percentage of electromagnetic radiation at the first wavelength is transmitted through at least a portion of the mask material after the at least a portion of the mask material is exposed to electromagnetic radiation at the second wavelength. Methods of patterning substrates using electromagnetic radiation sensitive mask materials are also provided. Compositions for producing masks are provided, and systems are provided.