This inventor holds 7 USPTO granted patents and 2 published patent applications. Top assignee: Texas Instruments Corporation. Active years: 1997-2008.
Company Filing History:
Years Active: 1997-2008
Title: Innovations of Timothy J Hogan
Introduction
Timothy J Hogan is a notable inventor based in Allen, TX (US). He has made significant contributions to the field of technology, particularly in display systems and photoresist ashing processes. With a total of 7 patents to his name, Hogan's work has had a considerable impact on the industry.
Latest Patents
Hogan's latest patents include a "System and method for increasing image quality in a display system" and a "Method for improving ash rate uniformity in photoresist ashing process equipment." The first patent focuses on maximizing image quality by eliminating vias on a reflective surface. This preferred embodiment involves depositing a first portion of a mirror surface over a support surface, applying a protective coating, and inverting the via. The process also includes removing a portion of the inverted via and depositing a second portion of the mirror surface, which reduces light scattering. The second patent addresses the edge-to-center photoresist ash rate uniformity in lower temperature processing of integrated circuits and micro-electro-mechanical devices. It introduces a varying gap distance from the edge to the center of the upper and lower grid plates of a plasma ashing machine, allowing for improved plasma gas flow and overcoming slower photoresist removal in the center of the wafer.
Career Highlights
Hogan is currently employed at Texas Instruments Corporation, where he continues to innovate and develop new technologies. His work has been instrumental in advancing the capabilities of display systems and photoresist processes.
Collaborations
Throughout his career, Hogan has collaborated with notable colleagues, including Mike Brenner and Lawrence D Dyer. These collaborations have further enriched his contributions to the field.
Conclusion
Timothy J Hogan's innovative work and patents reflect his dedication to advancing technology in display systems and photoresist processes. His contributions continue to influence the industry and inspire future innovations.