Laurel, MD, United States of America

Timothy D Corrigan

This inventor holds 1 USPTO granted patent. Top assignee: University System of Maryland. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Timothy D Corrigan. Retrieved from https://idiyas.com/inventor/timothy-d-corrigan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2010

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Timothy D. Corrigan and Controllable Nanoparticle Deposition

Introduction

Timothy D. Corrigan is an inventor associated with Laurel, Maryland, and the University System of Maryland. His work includes an invention for controlling how nanoparticles are deposited on patterned semiconductor substrates.

Latest Patents

Corrigan is credited with 1 patent: “Method and System for Controllable Deposition of Nanoparticles.” The invention describes using a reverse-bias electric field across p-n junctions to guide unipolarly charged nanoparticles from the gas phase onto selected p-doped or n-doped regions. The particles are laterally confined through the balance of electrostatic, van der Waals, and image forces. By adjusting the field to a predetermined strength, the method enables controlled deposition and offers a way to create electric-field patterns that direct particles with greater precision.

Career Highlights

Corrigan’s listed affiliation is the University System of Maryland. His patent focuses on applying familiar substrate architectures to nanoparticle placement, with potential utility in creating patterned materials and devices.

Collaborations

De-Hao Tsai and Raymond J. Phaneuf are identified as Corrigan’s coworkers and collaborators associated with this work.

Conclusion

Timothy D. Corrigan’s patented method presents a field-guided approach to depositing nanoparticles with greater control, highlighting his contribution to innovations in materials and semiconductor processing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…