The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2010
Filed:
Feb. 24, 2006
Michael R. Zachariah, Potomac, MD (US);
De-hao Tsai, Silver spring, MD (US);
Raymond J. Phaneuf, College Park, MD (US);
Timothy D. Corrigan, Laurel, MD (US);
Soo H. Kim, Rockville, MD (US);
Michael R. Zachariah, Potomac, MD (US);
De-Hao Tsai, Silver spring, MD (US);
Raymond J. Phaneuf, College Park, MD (US);
Timothy D. Corrigan, Laurel, MD (US);
Soo H. Kim, Rockville, MD (US);
University of Maryland, College Park, MD (US);
Abstract
In a method and system for controllable electrostatic-directed deposition of nanoparticles from the gas phase on a substrate patterned to have p-n junction(s), a bias electrical field is reversely applied to the p-n junction, so that uni-polarly charged nanoparticles are laterally confined on the substrate by a balance of electrostatic, van der Waals and image forces and are deposited on a respective p-doped or n-doped regions of the p-n junction when the applied electric field reaches a predetermined strength. The novel controllable deposition of nanoparticles employs commonly used substrate architectures for the patterning of an electric field attracting or repelling nanoparticles to the substrates and offers the opportunity to create a variety of sophisticated electric field patterns which may be used to direct particles with greater precision.