Tien-Chen Chang

Title: **Tien-Chen Chang: Innovating Capacitor Technology in Semiconductor Industry**

Introduction

Tien-Chen Chang is an accomplished inventor based in Hsin-Chu, Taiwan, known for his contributions to semiconductor technology. With a focus on enhancing dielectric stability and reliability in capacitors, his work directly impacts the efficiency of semiconductor devices.

Latest Patents

Tien-Chen Chang holds a significant patent titled "Procedure for eliminating fluorine degradation of WSi.sub.x." This innovation describes a method for forming a polycide/oxide/polysilicon capacitor on a silicon wafer. The process involves applying an in-situ high-temperature anneal to the wafer within a CVD reactor right before the deposition of the silicon oxide capacitor dielectric layer. This technique effectively facilitates fluorine outgassing from the polycide layer, preventing fluorine degradation in the subsequently deposited oxide capacitor dielectric. As a result, the capacitance of the completed capacitor can be increased by as much as 10% compared to those produced without the in-situ anneal.

Career Highlights

Tien-Chen Chang is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor fabrication industry. His role within the company underscores his commitment to innovative solutions that advance semiconductor technology.

Collaborations

Throughout his career, Tien-Chen has collaborated with esteemed colleagues, including Hsin-Pai Chen and Ching-Tang Tsai. These collaborations indicate a fruitful partnership focused on pushing the boundaries of technology within the semiconductor field.

Conclusion

With his groundbreaking patent and significant contributions to capacitor technology, Tien-Chen Chang exemplifies the spirit of innovation in the semiconductor industry. His work not only enhances the functionality of electronic devices but also positions him as a pivotal figure in advancing the technological landscape.