Company Filing History:
Years Active: 2015
Title: Innovations of Tianhui Li in Semiconductor Technology
Introduction
Tianhui Li is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on enhancing production efficiency and accuracy in lithography processes.
Latest Patents
Tianhui Li's latest patents include an exposure device and exposure method. The exposure device comprises a stage, a first clamp holder, a second clamp holder, and an optical projection unit. This innovative device is designed to improve production yield by accurately positioning the stage during the exposure of substrates. Additionally, he has developed a lithography machine and a scanning and exposing method that utilizes a sinusoidal motion for scanning, significantly increasing the effective time for exposure and enhancing wafer production efficiency.
Career Highlights
Tianhui Li is currently employed at Semiconductor Manufacturing International Corporation, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in developing advanced lithography techniques that are crucial for modern semiconductor manufacturing.
Collaborations
Throughout his career, Tianhui Li has collaborated with notable colleagues, including Qiang Wu and Jing'An Hao, who contribute to the innovative environment at Semiconductor Manufacturing International Corporation.
Conclusion
Tianhui Li's contributions to semiconductor technology through his patents and collaborative efforts highlight his role as a key innovator in the industry. His work continues to influence advancements in lithography and production efficiency.