This inventor holds 1 USPTO granted patent. Top assignees: Boe Technology Group Co., Ltd., Ordos Yuansheng Optoelectronics Co., Ltd.. Active years: 2019.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
1 out of 18,296 
1 out of 664 Years Active: 2019
Title: Innovator Spotlight: Tiangui Min and His Advancements in Exposure Technology
Introduction: Tiangui Min is a noted inventor based in Beijing, China, recognized for his contributions to the field of exposure technology. With a keen understanding of optics and diffraction limits, he has developed innovative solutions that address critical challenges in the industry. His singular patent reflects a commitment to advancing technology and improving the functionality of mask plates used in various applications.
Latest Patents: Min's key patent is for a mask plate designed to overcome diffraction limitations that hinder resolution. The invention details a mask plate that comprises a pattern structure with light blocking and transmitting regions. Additionally, the mask includes a total reflection structure featuring a high refraction layer and a first low refraction layer, arranged to optimize light transmission and improve imaging accuracy. This innovative design makes significant strides in enhancing exposure technology.
Career Highlights: Throughout his career, Min has made impactful contributions while working with notable companies, including BOE Technology Group Co., Ltd. and Ordos Yuansheng Optoelectronics Co., Ltd. His experience in these organizations has allowed him to apply his expertise in optics and develop solutions that resonate within the tech community.
Collaborations: In his journey as an inventor, Min has collaborated with talented colleagues such as Chaobo Zhang and Liangliang Liu. These partnerships have fostered an environment of innovation and creativity, enabling the creation of advanced technological solutions.
Conclusion: Tiangui Min stands out as an influential figure in the field of exposure technology. His innovative mask plate patent showcases his dedication to overcoming industry challenges and enhancing imaging capabilities. Through his career and collaborations, Min continues to contribute to technological advancements, solidifying his position as a significant inventor in the modern landscape.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile