Veldhoven, Netherlands

Tian Gang

This inventor holds 1 USPTO granted patent. Top assignee: Carl Zeiss Smt Gmbh. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tian Gang. Retrieved from https://idiyas.com/inventor/tian-gang-pvfxjips

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: The Innovations of Tian Gang

Introduction

Tian Gang is a notable inventor based in Veldhoven, Netherlands. He has made significant contributions to the field of optical systems, particularly in projection lithography. His innovative work has led to the development of a unique patent that enhances the efficiency of illumination optical systems.

Latest Patents

Tian Gang holds a patent for an "Illumination optical system for projection lithography." This invention includes a pupil facet mirror with pupil facets designed for selective reflection. The selectively reflecting pupil facet features a reflective coating for illumination light, with distinct areas of varying reflectivity. This innovative design allows for improved performance in projection lithography applications.

Career Highlights

Tian Gang is currently employed at Carl Zeiss SMT GmbH, a leading company in the field of optical systems and lithography technology. His work at this esteemed organization has allowed him to further develop his expertise and contribute to cutting-edge advancements in the industry.

Collaborations

Tian Gang collaborates with Jan Van Schoot, a fellow professional in the field. Their partnership exemplifies the importance of teamwork in driving innovation and achieving breakthroughs in technology.

Conclusion

Tian Gang's contributions to the field of optical systems, particularly through his patent for an illumination optical system, highlight his role as a significant inventor. His work continues to influence advancements in projection lithography, showcasing the impact of innovative thinking in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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