Riverside, RI, United States of America

Thomas Steinhäusler

This inventor holds 1 USPTO granted patent. Top assignee: Arch Specialty Chemicals, Inc.. Active years: 2007.


Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: Thomas Steinhäusler: Innovator in Lithography Technology

Introduction

Thomas Steinhäusler is a notable inventor based in Riverside, Rhode Island. He has made significant contributions to the field of photolithography, particularly with his innovative patent that enhances the efficiency of lithographic processes. His work is instrumental in advancing technologies that rely on precise imaging techniques.

Latest Patents

Steinhäusler holds a patent for a "Hydroxy-amino thermally cured undercoat for 193 nm lithography." This invention is directed to a thermally curable polymer composition, which includes a hydroxyl-containing polymer, an amino cross-linking agent, and a thermal acid generator. The thermally curable polymer composition can be dissolved in a solvent and utilized as an undercoat layer in deep UV lithography. This advancement is crucial for improving the quality and precision of lithographic substrates.

Career Highlights

Thomas Steinhäusler is associated with Arch Specialty Chemicals, Inc., where he applies his expertise in polymer chemistry and lithography. His role at the company allows him to collaborate with other professionals in the field, contributing to innovative solutions in chemical applications.

Collaborations

Some of his notable coworkers include Patrick Foster and Sydney George Slater. Their collective efforts in research and development have fostered an environment of innovation and creativity within the company.

Conclusion

Thomas Steinhäusler's contributions to lithography technology through his patent and work at Arch Specialty Chemicals, Inc. highlight his role as a key innovator in the field. His advancements continue to influence the industry and pave the way for future developments in photolithography.

Profile summary based on public USPTO records.
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