San Francisco, CA, United States of America

Thomas Schenkel

USPTO Granted Patents = 11 

Average Co-Inventor Count = 4.4

ph-index = 4

Forward Citations = 64(Granted Patents)


Company Filing History:


Years Active: 2001-2025

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11 patents (USPTO):Explore Patents

Title: Thomas Schenkel: Innovator in Charged Particle Acceleration

Introduction

Thomas Schenkel is a prominent inventor based in San Francisco, CA (US). He has made significant contributions to the field of materials science and particle acceleration, holding a total of 11 patents. His work focuses on advancing technologies that utilize dopant-vacancy centers and charged particle accelerators.

Latest Patents

Schenkel's latest patents include innovative systems and methods related to color centers in materials. One notable patent, titled "Dopant-vacancy centers in materials and methods of making thereof," describes a method that involves providing diamond doped with a dopant. A heavy-ion is directed through the diamond, forming a line of dopant-vacancy centers as it passes. Another significant patent is "Wafer-based charged particle accelerator, wafer components, methods, and applications." This invention outlines a wafer-based charged particle accelerator that includes a charged particle source, RF charged particle accelerator wafer sub-assemblies, and a power supply. The patent also discusses fabrication methods for these components.

Career Highlights

Throughout his career, Thomas Schenkel has worked with esteemed institutions such as the University of California and Cornell University. His research has contributed to advancements in the understanding and application of charged particle technologies.

Collaborations

Schenkel has collaborated with notable colleagues, including Arun Persaud and Qing Ji. Their combined expertise has furthered the development of innovative technologies in their respective fields.

Conclusion

Thomas Schenkel's contributions to the field of charged particle acceleration and materials science are noteworthy. His patents reflect a commitment to innovation and advancement in technology. His work continues to influence the scientific community and pave the way for future developments.

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