Company Filing History:
Years Active: 1997-2001
Title: Thomas R Fisher, Jr: Innovator in Chemical-Mechanical Polishing Technology
Introduction
Thomas R Fisher, Jr. is a notable inventor based in Beacon, NY (US). He has made significant contributions to the field of semiconductor processing, particularly in the area of chemical-mechanical polishing (CMP). With a total of 5 patents to his name, Fisher's work has advanced the technology used in the semiconductor industry.
Latest Patents
One of Fisher's latest patents is a method and apparatus for monitoring polishing pad wear during processing. In a CMP process, semiconductor substrates are rotated against a polishing pad to planarize substrate layers. The condition of the polishing pad directly affects the polishing rate of material removal and the uniformity of removal from the semiconductor wafer. Fisher's invention aims to extend the pad's useful life and maintain pad uniformity by measuring and monitoring the diminished pad thickness using a non-intrusive measurement system. This system employs an interferometer measurement technique utilizing ultrasound or electromagnetic radiation transmitters and receivers. It is sensitive to relative changes in pad thickness for uniformity and can detect abrupt changes, such as wafer detachment from the CMP wafer carrier.
Career Highlights
Fisher is currently associated with International Business Machines Corporation (IBM), where he continues to innovate in semiconductor processing technologies. His work has been instrumental in improving the efficiency and effectiveness of CMP processes.
Collaborations
Throughout his career, Fisher has collaborated with notable colleagues, including William Francis Landers and Mark A Jaso. These collaborations have contributed to the advancement of technologies in the semiconductor industry.
Conclusion
Thomas R Fisher, Jr. is a distinguished inventor whose contributions to chemical-mechanical polishing technology have had a lasting impact on the semiconductor industry. His innovative methods and collaborative efforts continue to shape the future of semiconductor processing.
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