Brecksville, OH, United States of America

Thomas J Mego


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 1986

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1 patent (USPTO):Explore Patents

Title: Thomas J Mego: Innovator in Differential Amplifier Technology

Introduction

Thomas J Mego is an accomplished inventor based in Brecksville, OH (US). He is known for his significant contributions to the field of electronics, particularly in the development of differential amplifiers. His innovative work has led to the creation of a patented technology that enhances the performance of electronic devices.

Latest Patents

Thomas J Mego holds a patent for the JFET ohmic differential amplifier. This invention serves as an input stage for electrometer operational amplifiers and is characterized by high input impedance and low leakage current. The design achieves these features by biasing the JFET transistors to operate in the ohmic region rather than the saturation region of their characteristic drain current-gate to source voltage curve. This advancement has important implications for improving the efficiency and accuracy of electronic measurements.

Career Highlights

Throughout his career, Thomas has worked at Keithley Instruments, Inc., a company renowned for its precision measurement instruments. His role at Keithley has allowed him to apply his expertise in developing cutting-edge technologies that meet the needs of various industries. His dedication to innovation has made a lasting impact on the field of electronics.

Collaborations

Thomas has collaborated with notable professionals in his field, including Kenneth A Reindel. Their joint efforts have contributed to advancements in electronic measurement technologies, further enhancing the capabilities of the instruments developed at Keithley Instruments.

Conclusion

Thomas J Mego's contributions to the field of electronics, particularly through his patented JFET ohmic differential amplifier, demonstrate his commitment to innovation and excellence. His work continues to influence the development of advanced measurement technologies.

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