Pleasanton, CA, United States of America

Thomas J Lenosky

This inventor holds 4 USPTO granted patents. Top assignee: University of California. Active years: 2002-2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Thomas J Lenosky. Retrieved from https://idiyas.com/inventor/thomas-j-lenosky

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 6.3

ph-index = 1

Forward Citations = 7(Granted Patents)


Location History:

  • Santa Clara, CA (US) (2003)
  • Pleasanton, CA (US) (2002 - 2005)

Company Filing History:


Years Active: 2002-2005

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4 patents (USPTO):Explore Patents

Title: Innovations of Thomas J Lenosky

Introduction

Thomas J Lenosky is a prominent inventor based in Pleasanton, CA (US). He has made significant contributions to the field of semiconductor materials and methods for enhancing the solubility of dopants in silicon. With a total of 4 patents to his name, Lenosky's work has implications for the advancement of semiconductor technology.

Latest Patents

One of Lenosky's latest patents is titled "Semiconductor material and method for enhancing solubility of a dopant therein." This innovative method focuses on enhancing the equilibrium solubility of boron and indium in silicon. By utilizing first-principles quantum mechanical calculations, Lenosky determined the temperature dependence of the equilibrium solubility of these important p-type dopants under various strain conditions. His findings indicate that the equilibrium thermodynamic solubility of size-mismatched impurities can be significantly increased with appropriate strain applied to the silicon substrate. For instance, a 1% compressive strain can raise boron's equilibrium solubility by 100% at 1100°C, while a 1% tensile strain can enhance indium's solubility by 200% at the same temperature.

Another notable patent is the "Method for enhancing the solubility of dopants in silicon." This method enhances the equilibrium solid solubility of dopants in silicon, germanium, and silicon-germanium alloys by subjecting the silicon-based substrate to biaxial or compressive strain. Lenosky's research shows that boron solubility can be significantly enhanced by a compressive bi-axial strain, based on size-mismatch theory. The findings suggest that the enhancement of dopant solubility with strain is most effective when the charge and size-mismatch of the impurity favor the same type of strain.

Career Highlights

Lenosky is affiliated with the University of California, where he continues to contribute to research and innovation in semiconductor technology. His work has been instrumental in understanding the behavior of dopants in silicon and improving their solubility, which is crucial for the development of advanced semiconductor devices.

Collaborations

Throughout his career, Lenosky has collaborated with notable colleagues, including Babak Sadigh and Tomas Diaz De La Rubia. These collaborations have further enriched his research and contributed to the advancement

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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