Thomas F Curran, Jr

Title: Thomas F Curran, Jr: Innovator in Semiconductor Metallurgy

Introduction

Thomas F Curran, Jr. is a notable inventor based in Milton, VT (US). He has made significant contributions to the field of semiconductor devices, particularly in the area of copper metallurgy. His innovative approach has led to advancements that are crucial for the development of modern electronics.

Latest Patents

Thomas F Curran, Jr. holds 1 patent for a method titled "Method for reworking copper metallurgy in semiconductor devices." This patent describes a comprehensive method that includes selective removal of insulator, selective removal of copper, non-selective removal of copper and insulator, followed by the redeposition of an insulating copper barrier layer and at least one metallurgical interconnect layer. This invention is pivotal for enhancing the performance and reliability of semiconductor devices.

Career Highlights

Curran is associated with the International Business Machines Corporation (IBM), where he has been instrumental in research and development efforts. His work at IBM has allowed him to explore innovative solutions that address the challenges faced in semiconductor manufacturing.

Collaborations

Throughout his career, Thomas has collaborated with esteemed colleagues, including Timothy Charles Krywanczyk and Michael S Lube. These collaborations have fostered a productive environment for innovation and have contributed to the success of various projects.

Conclusion

Thomas F Curran, Jr. is a distinguished inventor whose work in semiconductor metallurgy has made a lasting impact on the industry. His innovative methods continue to influence the development of advanced electronic devices.