Nuremberg, Germany

Theo Hartmann

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Nanoworld Ag. Active years: 2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Theo Hartmann. Retrieved from https://idiyas.com/inventor/theo-hartmann

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile



Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2005

Loading Chart...
Loading Chart...
1 patent (USPTO):Explore Patents

Title: Innovations of Theo Hartmann

Introduction

Theo Hartmann is an accomplished inventor based in Nuremberg, Germany. He has made significant contributions to the field of micro devices, showcasing his expertise through innovative patents. His work is characterized by a focus on advanced materials and processes that enhance device functionality.

Latest Patents

One of Theo Hartmann's notable patents is for a micro device and the process for producing it. This invention involves a micro device comprising a SU-8 photoresist layer adhered to a thin layer of materials such as silicon nitride, silicon oxide, metal, and diamond. The SU-8 layer is clamped onto the thin layer using an under-etching technique, which allows for precise manufacturing and improved performance of micro devices. He holds 1 patent in this area.

Career Highlights

Theo Hartmann is currently employed at Nanoworld AG, where he continues to push the boundaries of micro device technology. His work at the company has positioned him as a key player in the development of innovative solutions in the field.

Collaborations

Throughout his career, Theo has collaborated with notable colleagues, including Manfred Detterbeck and Stefan Lutter. These partnerships have fostered a creative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Theo Hartmann's contributions to the field of micro devices exemplify his innovative spirit and dedication to advancing technology. His work not only highlights his individual talent but also reflects the collaborative nature of invention in the modern world.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…