The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 2005
Filed:
Jul. 30, 2003
Applicants:
Manfred Detterbeck, Neuchatel, CH;
Stefan Lutter, Neuchatel, CH;
Mathieu Burri, Court, CH;
Theo Hartmann, Nuremberg, DE;
Terunobu Akiyama, Neuchatel, CH;
Inventors:
Manfred Detterbeck, Neuchatel, CH;
Stefan Lutter, Neuchatel, CH;
Mathieu Burri, Court, CH;
Theo Hartmann, Nuremberg, DE;
Terunobu Akiyama, Neuchatel, CH;
Assignee:
NanoWorld AG, Neuchatel, CH;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F009/00 ;
U.S. Cl.
CPC ...
Abstract
A micro device comprising a SU-8 photoresist layer adhered to a thin layer of, for example, silicon nitride, silicon oxide, metal, and diamond. The SU-8 layer is clamped on the thin layer by using an under-etching technique.
Detterbeck, Manfred. (2005). Micro device and process for producing it (U.S. Patent No. 6953751). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6953751
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile