Eindhoven, Netherlands

Theo H J Bisschops

This inventor holds 2 USPTO granted patents. Top assignee: Asml Netherlands B.v.. Active years: 2003-2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Theo H J Bisschops. Retrieved from https://idiyas.com/inventor/theo-h-j-bisschops

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2003-2004

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2 patents (USPTO):Explore Patents

Title: Unveiling the Innovations of Theo H J Bisschops

Introduction:

Theo H J Bisschops, a renowned inventor hailing from Eindhoven, Netherlands, has made significant contributions to the field of lithographic projection apparatus. With a strong focus on precision engineering and cutting-edge technology, Bisschops has garnered recognition for his groundbreaking inventions.

Latest Patents:

Bisschops' latest patents revolve around a lithographic projection apparatus featuring a pneumatic gravity compensator. This innovative design includes components such as a gas-filled pressure chamber, a gas bearing, and evacuating means to enhance the positioning accuracy of object tables within the vacuum chamber. The incorporation of a partially flexible rod further amplifies the functionality of this apparatus.

Career Highlights:

Working diligently at ASML Netherlands B.V., Bisschops has demonstrated a remarkable dedication to advancing lithographic technology. His expertise in designing intricate systems has led to the development of state-of-the-art apparatus aimed at revolutionizing the semiconductor industry. Bisschops' meticulous attention to detail and inventive spirit have set him apart as a trailblazer in his field.

Collaborations:

Throughout his illustrious career, Bisschops has collaborated closely with esteemed colleagues such as Eric W A Janssen and Marcel J M Renkens. Together, they have synergized their expertise to drive innovation and push the boundaries of technological possibilities. The collective efforts of these talented individuals have culminated in the creation of cutting-edge devices that are shaping the future of lithography.

Conclusion:

In conclusion, Theo H J Bisschops stands as a beacon of innovation in the realm of lithographic projection apparatus. His prolific career, marked by groundbreaking patents and fruitful collaborations, underscores his commitment to pushing the boundaries of technological excellence. As Bisschops continues to spearhead advancements in precision engineering, his legacy of inventiveness and ingenuity is sure to endure for years to come.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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