Tetuo Kurisaki

Title: The Innovative Contributions of Tetuo Kurisaki

Introduction

Tetuo Kurisaki is a notable inventor based in Kawasaki, Japan. He has made significant contributions to the field of plasma etching technology, particularly in the processing of aluminum-based films. His innovative methods have paved the way for advancements in various industrial applications.

Latest Patents

Kurisaki holds a patent for a plasma etching method specifically designed for aluminum-based films. This method involves placing a workpiece with an exposed aluminum-based film on a cathode, which is arranged opposite an anode. A plasma generating gas, consisting of carbon tetrachloride and chlorine, is introduced at a pressure of 0.1 Torr or less. The method ensures that the ratio of the partial pressure of chlorine to the total pressure of the plasma generating gas is 0.8 or less. By applying high-frequency electric power between the cathode and anode, plasma is generated, which effectively etches the exposed portion of the aluminum-based film.

Career Highlights

Throughout his career, Kurisaki has worked with several prominent companies, including Tokuda Seisakusyo, Ltd. and Tokyo Shibaura Denki Kabushiki Kaisha. His experience in these organizations has contributed to his expertise in plasma etching and related technologies.

Collaborations

Kurisaki has collaborated with notable colleagues such as Yasuhiro Horiike and Takashi Yamazaki. Their combined efforts have further advanced the field of plasma etching and have led to innovative solutions in various applications.

Conclusion

Tetuo Kurisaki's contributions to the field of plasma etching have been significant and impactful. His innovative methods and collaborations with industry professionals highlight his dedication to advancing technology. His work continues to influence the development of aluminum-based film processing techniques.