Company Filing History:
2 out of 131,744 
1 out of 10,341 
Years Active: 2001-2004
Title: Tetsuji Yasuda: Innovator in Semiconductor Technology
Introduction
Tetsuji Yasuda is a prominent inventor based in Ibaraki, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His innovative work focuses on manufacturing methods for semiconductor devices and field-effect transistors.
Latest Patents
Yasuda's latest patents include a manufacturing method for a field-effect transistor and a manufacturing method for a semiconductor device. In his first patent, he describes a process for forming a film on a wafer's surface through thermal processing. This involves using depolarized laser light to irradiate the wafer's surface, with optical sensors detecting intensity changes to determine film thickness. His second patent introduces a mask for the selective growth of a solid, which allows for growth in a predetermined region of a substrate while suppressing growth in other areas. This mask features a surface layer and an underlayer with different chemical compositions, enhancing stability and reducing defects.
Career Highlights
Throughout his career, Tetsuji Yasuda has worked with leading companies in the semiconductor industry, including Samsung Electronics Co., Ltd. and Tokyo Electron Limited. His experience in these organizations has contributed to his expertise in semiconductor manufacturing processes.
Collaborations
Yasuda has collaborated with notable colleagues such as Kazuyuki Ikuta and Satoshi Yamasaki, further enriching his work in the field.
Conclusion
Tetsuji Yasuda's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His innovative methods continue to impact the industry and pave the way for future advancements.