Company Filing History:
Years Active: 2002-2003
Title: Tetsuji Oishi: Innovator in Wafer Cleaning Technology
Introduction
Tetsuji Oishi is a notable inventor based in Shizuoka-ken, Japan. He has made significant contributions to the field of wafer cleaning technology, holding a total of 2 patents. His innovative designs focus on improving the efficiency and effectiveness of cleaning processes for semiconductor wafers.
Latest Patents
Oishi's latest patents include a wafer cleaning device and a multi-step flow cleaning method. The wafer cleaning device features a band-shaped tray with grasping grooves for handling wafers and a cleaning tank designed to facilitate the cleaning process. The tank is equipped with guides for tray mounting, a V-shaped bottom to conform to the wafer's shape, and flow ports for cleaning fluid. Additionally, an overflow tank is integrated to manage excess cleaning fluid.
The multi-step flow cleaning method and apparatus aim to enhance the cleaning of workpieces using a stream of cleaning solution. This system includes a cleaning tank, a supply line for delivering cleaning solutions, and a valve that regulates the flow. The valve is designed to control the outflow of the cleaning solution, ensuring optimal cleaning performance while minimizing foreign matter accumulation on the workpieces.
Career Highlights
Oishi is currently employed at Spc Electronics Corporation, where he continues to develop innovative solutions in the semiconductor industry. His work has significantly impacted the efficiency of wafer cleaning processes, making him a valuable asset to his company.
Collaborations
Throughout his career, Oishi has collaborated with talented individuals such as Haruki Sonoda and Masatoshi Hirokawa. These partnerships have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.
Conclusion
Tetsuji Oishi's contributions to wafer cleaning technology exemplify his dedication to innovation in the semiconductor industry. His patents reflect a commitment to improving cleaning processes, which are essential for maintaining the quality of semiconductor devices.