Takefu, Japan

Tetsuhiro Oda


Average Co-Inventor Count = 4.5

ph-index = 4

Forward Citations = 53(Granted Patents)


Location History:

  • Takefu, JP (1992 - 1993)
  • Fukui, JP (1995)
  • Fukushima-ken, JP (2000)
  • Nishishirakawa, JP (1998 - 2013)

Company Filing History:


Years Active: 1992-2013

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6 patents (USPTO):Explore Patents

Title: Tetsuhiro Oda: Innovator in Silicon Single Crystal Growth

Introduction

Tetsuhiro Oda is a prominent inventor based in Takefu, Japan. He has made significant contributions to the field of silicon single crystal growth, holding a total of 6 patents. His innovative methods have improved the yield and productivity of silicon single crystals, which are essential in various technological applications.

Latest Patents

Oda's latest patents include a method for silicon single crystal growth and a pulling apparatus designed to enhance the efficiency of the Czochralski method. The first patent describes a process where a DC voltage is applied between the outer wall of a quartz crucible and a pulling wire, facilitating the growth of a silicon single crystal from a melt. The second patent focuses on gradually increasing the pulling rate of the single crystal during the formation of the tail part, which helps in preventing rapid temperature changes and improving the overall quality of the crystal.

Career Highlights

Oda is currently employed at Shin-Etsu Handotai Co., Ltd., a leading company in the semiconductor industry. His work has been instrumental in advancing the techniques used in silicon crystal production, contributing to the company's reputation for high-quality materials.

Collaborations

Throughout his career, Oda has collaborated with notable colleagues such as Atsushi Iwasaki and Toshiharu Uesugi. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Tetsuhiro Oda's contributions to the field of silicon single crystal growth have made a significant impact on the industry. His innovative patents and collaborative efforts continue to drive advancements in technology.

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