Sagamihara, Japan

Tetsu Oosawa


Average Co-Inventor Count = 2.5

ph-index = 7

Forward Citations = 495(Granted Patents)


Company Filing History:


Years Active: 1994-2002

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7 patents (USPTO):Explore Patents

Title: Inventor Tetsu Oosawa: Innovations from Sagamihara, Japan

Introduction

Tetsu Oosawa is a prominent inventor based in Sagamihara, Japan, known for his contributions to the field of plasma processing technologies. With a remarkable portfolio of seven patents, he has made significant advancements that enhance the efficiency and functionality of modern processing apparatuses.

Latest Patents

Among his latest inventions is a "Microwave plasma processing apparatus having a vacuum pump located under a susceptor." This innovative apparatus features a process chamber designed to subject objects to plasma processing within a maintained negative pressure environment. The system includes a susceptor that holds the object during processing. The susceptor's movement is facilitated by a mechanism located outside the process chamber, allowing for controlled and precise operations. Additionally, a vacuum pump is strategically positioned at the bottom of the chamber to ensure optimal conditions for plasma processing.

Another notable invention by Oosawa includes a "Substrate transfer apparatus and heat treatment system using the same," which further showcases his commitment to advancing processing technologies in various industries.

Career Highlights

Throughout his career, Tetsu Oosawa has worked with esteemed companies in the field of technology and semiconductor manufacturing, including Tokyo Electron Limited and Tokyo Electron Sagami Limited. His experience in these leading companies has enabled him to hone his skills and contribute to innovative solutions in plasma processing.

Collaborations

Oosawa's work has often involved collaboration with skilled professionals such as Teruo Asakawa and Kenji Nebuka. Their combined expertise has led to the development of groundbreaking technologies that continue to impact the industry positively.

Conclusion

Tetsu Oosawa's contributions to the field of plasma processing through his inventive solutions highlight his significance as an inventor. His patents not only reflect his innovative spirit but also serve as a foundation for advancements in technology that shape the future of processing apparatuses. With a commitment to excellence and collaboration, Oosawa is a valuable figure in the realm of invention.

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