This inventor holds 1 USPTO granted patent. Top assignees: C.uyemura Co., Ltd., Taihei Chemical Industrial Co., Ltd.. Active years: 1997.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1997
Title: Teruyoshi Izawa: Innovator in Nickel Plating Recovery
Introduction
Teruyoshi Izawa is a notable inventor based in Kasugai, Japan. He has made significant contributions to the field of materials recovery, particularly in the recovery of valuable substances from spent electroless nickel plating solutions. His innovative approach has implications for both environmental sustainability and resource efficiency.
Latest Patents
Izawa holds a patent for the recovery of valuable substances from a spent electroless nickel plating solution. This patent outlines a method that involves adding oxalic acid to precipitate nickel ions as nickel oxalate, which can then be removed and recovered. The process also includes the optional addition of sulfides to precipitate heavy metal ions as heavy metal sulfides. Furthermore, the method describes the use of mineral acids and various calcium compounds to convert remaining materials into recoverable forms, such as hydroxyapatite.
Career Highlights
Throughout his career, Teruyoshi Izawa has worked with prominent companies, including C. Uyemura Co., Ltd. and Taihei Chemical Industrial Co., Ltd. His experience in these organizations has allowed him to develop and refine his innovative techniques in materials recovery.
Collaborations
Izawa has collaborated with notable colleagues, including Yoshihiro Kani and Kazunori Kudo. These partnerships have contributed to the advancement of his research and the successful implementation of his patented methods.
Conclusion
Teruyoshi Izawa's work in the recovery of valuable substances from nickel plating solutions showcases his innovative spirit and commitment to sustainability. His contributions to the field are significant and continue to influence practices in materials recovery.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile