This inventor holds 6 USPTO granted patents. Top assignees: Mitsubishi Denki Kabushiki Kaisha, Mitsubishi Denki K.k.. Active years: 1983-1996.
Location History:
- Takarazuka, JP (1983 - 1985)
- Hyogo, JP (1984 - 1991)
- Amagasaki, JP (1996)
Company Filing History:
Years Active: 1983-1996
Title: Teruo Ina: Innovator in Integrated Circuit Technology
Introduction
Teruo Ina is a prominent inventor based in Hyogo, Japan, known for his contributions to the field of integrated circuit technology. With a total of 6 patents to his name, he has made significant advancements that have impacted the electronics industry.
Latest Patents
One of his latest patents involves a large-scale integrated circuit device. This innovative device includes a barrier layer as an underlying layer for a wiring conductor layer. The barrier layer can be formed of titanium oxide-titanium nitride or titanium nitride, and it may also contain oxygen or carbon. The method of manufacturing this integrated circuit device includes introducing a gas to the vicinity of a substrate within a vacuum chamber and forming a thin film by depositing titanium in vapor phase using a cluster-type ion source while irradiating the substrate with nitrogen ions. Additionally, he has developed a substrate cleaning device that utilizes a gas jet nozzle and electron beam irradiation to ensure uniform bombardment of ions onto the substrate.
Career Highlights
Throughout his career, Teruo Ina has worked with notable companies such as Mitsubishi Denki Kabushiki Kaisha and Mitsubishi Denki K.K. His work has been instrumental in advancing technologies related to integrated circuits and substrate cleaning processes.
Collaborations
He has collaborated with esteemed colleagues, including Hiroki Ito and Hisao Yoshida, contributing to various projects that have furthered the development of innovative technologies in the field.
Conclusion
Teruo Ina's contributions to integrated circuit technology and his innovative patents highlight his role as a key figure in the electronics industry. His work continues to influence advancements in technology and manufacturing processes.

