The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 08, 1991
Filed:
May. 18, 1989
Applicant:
Inventors:
Hiroki Ito, Hyogo, JP;
Teruo Ina, Hyogo, JP;
Assignee:
Mitsubishi Denki K.K., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
118723 ; 118 501 ;
Abstract
A substrate cleaning device comprises a gas jet nozzle for jetting gas toward a substrate, an electron beam irradiation selection for irradiating electron beams into the jetted gas to induce glow discharge, and an ion acceleration section for drawing ions out of the glow discharge to impart the ions with energy, causing the ions to uniformly bombard onto the substrate.
Ito, Hiroki. (1991). Substrate cleaning device (U.S. Patent No. 5054421). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5054421
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