Renens, Switzerland

Teodor Rosca

This inventor holds 1 USPTO granted patent. Top assignee: Ecole Polytechnique Federale De Lausanne. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Teodor Rosca. Retrieved from https://idiyas.com/inventor/teodor-rosca

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Teodor Rosca: Innovator in Charge Sensing Technology

Introduction

Teodor Rosca is a notable inventor based in Renens, Switzerland. He has made significant contributions to the field of charge sensing technology. His innovative work has led to the development of a unique sensing device that addresses the need for accurate detection of minor charge variations.

Latest Patents

Teodor holds a patent for a "Sensing device for sensing minor charge variations." This device features a tunneling field-effect transistor (TFET) with at least one sense gate. Additionally, it incorporates a capacitive coupling that connects the charge storage area with the sense gate. This invention is crucial for enhancing the precision of charge detection in various applications.

Career Highlights

Teodor Rosca is affiliated with the École Polytechnique Fédérale de Lausanne, a prestigious institution known for its cutting-edge research and innovation. His work at this institution has allowed him to explore advanced technologies and contribute to the scientific community.

Collaborations

Teodor has collaborated with esteemed colleagues, including Cem Alper and Mihai Adrian Ionescu. These partnerships have fostered a dynamic research environment, leading to further advancements in their respective fields.

Conclusion

Teodor Rosca's contributions to charge sensing technology exemplify the impact of innovative thinking in engineering. His patent and collaborative efforts highlight the importance of research and development in advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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