Teng Hwee Ng

Title: Innovations of Teng Hwee Ng

Introduction

Teng Hwee Ng is a notable inventor based in Singapore, recognized for his contributions to the field of semiconductor manufacturing. He has made significant strides in developing technologies that enhance the precision of lithographic processes used in integrated circuit fabrication.

Latest Patents

One of his key patents is titled "In-line focus monitor structure and method using top-down SEM." This invention relates to a test structure formed on a reticle simultaneously with a pattern used to build an integrated circuit device. The test structure features a large rectangular end with several rectangular shapes extending in a parallel array. The width of these extensions matches the spacing between them and corresponds to the minimum feature size in the lithographic process being monitored. A CD SEM is employed to measure the edge width of the convex and concave sections of the structure as printed in photoresist at various focus settings. A plot of edge width versus focus setting is generated, and the intersection of the lines representing the convex and concave section measurements indicates the optimal focus setting for the lithographic process. This innovation is crucial for improving the accuracy and efficiency of semiconductor manufacturing.

Career Highlights

Teng Hwee Ng is currently associated with Chartered Semiconductor Manufacturing Ltd, a prominent corporation in the semiconductor industry. His work has contributed to advancements in manufacturing processes that are vital for the production of integrated circuits.

Collaborations

Throughout his career, Teng has collaborated with esteemed colleagues such as Wen-Zhan Zhou and Goswami Indranil. These partnerships have fostered an environment of innovation and have led to the development of cutting-edge technologies in the semiconductor field.

Conclusion

Teng Hwee Ng's contributions to semiconductor manufacturing through his innovative patent and collaborative efforts highlight his importance in the industry. His work continues to influence the precision and efficiency of integrated circuit fabrication processes.