Taipei, Taiwan

Teng-Chin Kuo

USPTO Granted Patents = 5 

Average Co-Inventor Count = 4.4

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2016

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5 patents (USPTO):Explore Patents

Title: Innovations of Teng-Chin Kuo

Introduction

Teng-Chin Kuo is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of lithography, particularly in methods that enhance the precision of overlay processes. With a total of 5 patents to his name, Kuo's work is recognized for its innovative approaches to complex engineering challenges.

Latest Patents

One of Kuo's latest patents is an "Asymmetry compensation method used in lithography overlay process." This method involves providing a first substrate with a circuit layout, where a first and second mask layer are stacked sequentially. The unique aspect of this invention is the unequal x-axis and y-axis allowable deviation ranges, which are crucial for calculating final compensation parameters.

Another notable patent is the "Overlap mark set and method for selecting recipe of measuring overlap error." This invention features an overlap mark set that includes at least two overlap marks located at the same pattern layer. The first overlap mark consists of X-directional and Y-directional linear patterns with preset offsets, while the second overlap mark has different preset offsets. This innovation aims to improve the accuracy of measuring overlap errors in lithography.

Career Highlights

Kuo is currently employed at United Microelectronics Corporation, a leading semiconductor foundry. His work at this company has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in semiconductor technology.

Collaborations

Kuo has collaborated with several talented individuals in his field, including En-Chiuan Liou and Chun-Chi Yu. These collaborations have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Teng-Chin Kuo's contributions to the field of lithography through his innovative patents demonstrate his expertise and commitment to advancing technology. His work continues to influence the semiconductor industry and showcases the importance of innovation in engineering.

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