The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 01, 2016

Filed:

May. 15, 2014
Applicant:

United Microelectronics Corp., Hsinchu, TW;

Inventors:

En-Chiuan Liou, Tainan, TW;

Chia-Chang Hsu, Kaohsiung, TW;

Yi-Ting Chen, Kaohsiung, TW;

Teng-Chin Kuo, Taipei, TW;

Chun-Chi Yu, Taipei, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70516 (2013.01);
Abstract

An overlap mark set is provided to have at least a first and a second overlap marks both of which are located at the same pattern layer. The first overlap mark includes at least two sets of X-directional linear patterns, having a preset offset atherebetween; and at least two sets of Y-directional linear patterns, having the preset offset atherebetween. The second overlap mark includes at least two sets of X-directional linear patterns, having a preset offset btherebetween; and at least two sets of Y-directional linear patterns, having the preset offset btherebetween. The preset offsets aand bare not equal.


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